Top.Mail.Ru

High-Resolution Dry Film Photoresist HC-1540

Product Overview

HC-1540 dry film photoresist rolls

HC-1540 is a high-resolution dry film photoresist designed for precision circuitry and fine-pattern PCB manufacturing. It provides strong adhesion, high imaging resolution, and a wide, stable operating range, supporting accurate pattern formation and consistent processing performance. Its water-soluble development system enables efficient and clean processing.

Technical Specifications

Technical ParameterTypical Value
Dry Film Thickness38 µm
Diffuse Exposure Energy60 mJ/cm² (50–70 mJ/cm²)
Collimated Exposure Energy53 mJ/cm² (38–74 mJ/cm²)
Developing Conditions0.8–1.2% Na₂CO₃, 30 ± 2°C, 30–40 s minimum
Resolution40 µm
Adhesion35 µm
Stripping Condition5% NaOH, 50°C, 60 s
PE Film Strength6 N/m

Key Features

High Resolution:
Supports fine-line pattern formation for flexible PCB and high-density circuit applications.

Excellent Photosensitivity:
Provides consistent exposure performance for reliable image transfer during PCB manufacturing.

Strong Adhesion:
Provides good adhesion to the substrate, helping maintain pattern integrity during processing.

Fast Exposure Response:
Supports efficient exposure processes and stable production performance.

Water-Soluble Development:
Designed for water-soluble development to support efficient and clean processing.

Product Format & Dimensions

ItemSpecification
Dry film thickness38 µm
Available dry film width200–600 mm; slit to the specified width
Standard dry film length656 ft (200 m)

Recommended Processing Conditions

StepRecommended condition
Board pre-treatmentRemove debris, oil and oxides; rinse and dry. Non-woven fabric and pumice treatment may be used.
LaminationRoll temperature 110 ± 10°C; pressure 4–5 kg; manual speed 1.0–1.5 m/min or automatic speed 2.0–3.0 m/min.
Hold before exposureUnder orange safe light: 20 ± 2°C, 60 ± 10% RH, 5 min.
ExposureUse a 21-step exposure guide at 6–8 steps; suitable exposure sources include mercury lamp and LED.
Hold after exposure23 ± 2°C, 60 ± 10% RH, 10–15 min.
Development0.8–1.2% anhydrous sodium carbonate at 30 ± 2°C; spray pressure 0.12–0.20 MPa.
Stripping3–5 wt% sodium hydroxide at 50 ± 5°C; spray pressure ≥ 0.2 MPa.

Safety & Storage Guidelines

  • Use the product only under appropriate safety lighting; avoid direct sunlight and prolonged exposure to white light.
  • Avoid direct contact with the photosensitive layer. If contact occurs, wash thoroughly; if it enters the eyes, rinse with water and seek medical attention.
  • Use local or general exhaust during lamination. Wear suitable eye and hand protection when handling alkaline developer or stripper.
  • Store horizontally in a cool, dry place at 5–20°C and 40–60% RH. Use within 60 days.

Get a Quote — HC-1540